Veeco announces the industry’s ‘’first’’ fully-integrated MBE system for the compound semiconductor R&D market.
With the expectations to change
the way researchers use MBE (Molecular Beam Epitaxy) Veeco, has introduced today, the GENxplor™Molecular Beam Epitaxy (MBE) Deposition System. Billed as the industry’s first fully-integrated MBE system for the
compound semiconductor R&D market, the GENxplor aims to
create:
create:
·
High quality epitaxial layers
on substrates up to 3” in diameter
·
Be ideal for cutting edge
research on a wide variety of materials including GaAs, nitrides, and oxides.
·
provides convenient access to
effusion cells,
Connectikpeople has also discovered that, the GENxplor uses Veeco’s GEN10™
growth chamber design and features unmatched process flexibility, aimed to be ideal
for materials research on emerging technologies such as UV LEDs,
high-efficiency solar cells, and high-temperature superconductors.
About Veeco
Veeco’s process equipment solutions enable the manufacture of LEDs, power
electronics, hard drives, MEMS and wireless chips. We are the market leader in
MOCVD, MBE, Ion Beam and other advanced thin film process technologies. Our
high performance systems drive innovation in energy efficiency, consumer
electronics and network storage and allow our customers to maximize
productivity and achieve lower cost of ownership.
